This title appears in the Scientific Report :
2018
Impact of Traps in Ferroelectric HfYOx on Negative Capacitance MOSFETs
Impact of Traps in Ferroelectric HfYOx on Negative Capacitance MOSFETs
Saved in:
Personal Name(s): | Han, Qinghua |
---|---|
Tromm, Thomas Carl Ulrich / Aleksa, Paulus / Schubert, Jürgen / Mantl, Siegfried / Zhao, Qing-Tai (Corresponding author) | |
Contributing Institute: |
Halbleiter-Nanoelektronik; PGI-9 |
Imprint: |
2018
|
Conference: | 2018 IEEE Silicon Nanoelectronics Workshop, Honolulu (USA), 2018-06-17 - 2018-06-18 |
Document Type: |
Conference Presentation |
Research Program: |
Controlling Electron Charge-Based Phenomena |
Publikationsportal JuSER |
Description not available. |