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Hollfelder, Martin
FGKF - Chemical vapor deposition
Electronic Edition
Theses
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Hollfelder, Martin
FGKF - Chemical vapor deposition
Electronic Edition
Theses
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E-Book
Verwendbarkeit von N2 als Trägergas bei der Niedrigdruck- Gasphasenepitaxie von GaAs and Al(x)Ga(1-x)As [E-Book] /
Hollfelder, Martin
1993
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Theses
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ZB
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Name
Hollfelder, Martin
Subject
gallium arsenide
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vapor phase epitaxy
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FGKF - Chemical vapor deposition
FJKC - III - V semiconductors
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German
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