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FGKF - Chemical vapor deposition
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FJKC - III - V semiconductors
ZB
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FGKF - Chemical vapor deposition
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FJKC - III - V semiconductors
ZB
Theses
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Reaction and transport processes in OMCVD : selective and group III-nitride growth /
Mihopoulos, Theodoros.
1999
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Verwendbarkeit von N2 als Trägergas bei der Niedrigdruck- Gasphasenepitaxie von GaAs and Al(x)Ga(1-x)As [E-Book] /
Hollfelder, Martin
1993
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Hollfelder, Martin
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Mihopoulos, Theodoros.
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III - V semiconductor
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chemical vapor deposition
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gallium arsenide
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modeling
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thin film
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vapor phase epitaxy
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FGKF - Chemical vapor deposition
FJKC - III - V semiconductors
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