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Innovative processing of films and nanocrystalline powders /
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Chemical vapour deposition : an integrated engineering design for advanced materials /
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Chemical vapour deposition of main group metal oxides and phosphides : aspects of synthesis and functional property /
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Metallorganische chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung /
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The Chemistry of Metal CVD /
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Synthetic diamond : emerging CVD science and technology /
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Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications /
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Handbook of chemical vapor deposition (CVD) : principles, technology, and applications /
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Silver transport in CVD silicon carbide /
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Synthesis of inorganic materials /
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Chemical vapor deposition of refractory metals and ceramics vol 0003 : Symposium on chemical vapor deposition of refractory metals and ceramics 0003: papers : Fall meeting of the Materials Research Society : Boston, MA, 28.11.94-30.11.94.
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Diamond for electronic applications: symposium: proceedings : Boston, MA, 27.11.95-01.12.95.
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Chemical vapor deposition of refractory metals and ceramics 0002: symposium : MRS fall meeting 1991 : Boston, MA, 04.12.91-06.12.91.
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Mechanisms of reactions of organometallic compounds with surfaces : NATO advanced research workshop on the mechanisms of reactions of organometallic compounds with surfaces: proceedings : Saint-Andrews, 22.06.88-24.06.88 /
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Chemical vapor deposited materials.
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Chemical vapor deposition: principles and applications.
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Crystal habit of CVD grown silicon in relation to adsorption processes.
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Metal organic chemical vapor deposition of electronic ceramics : Metalorganic chemical vapor deposition of electronic ceramics: symposium : MRS fall meeting 1993 : Boston, MA, 29.11.93-03.12.93.
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Chemical vapor deposition of refractory metals and ceramics: symposium : Fall meeting of the Materials Research Society. 1989 : Boston, MA, 29.11.89-01.12.89.
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International conference on chemical vapor deposition 0011: proceedings : CVD 0011: proceedings : Meeting of the Electrochemical Society 1990 : Seattle, WA, 10.90.
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