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FGKF - Chemical vapor deposition
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thin film
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FGKF - Chemical vapor deposition
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thin film
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Metallorganische chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung /
Puchalla, Jochen
2007
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Reaction and transport processes in OMCVD : selective and group III-nitride growth /
Mihopoulos, Theodoros.
1999
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Metallorganische chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung [E-Book] /
Puchalla, Jochen
2007
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Puchalla, Jochen
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Mihopoulos, Theodoros.
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chemical vapor deposition
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thin film
III - V semiconductor
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modeling
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FGKF - Chemical vapor deposition
FJKC - III - V semiconductors
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German
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