1
Microcircuit engineering. 1989 : Microcircuit engineering: international conference. 15 : International conference on microlithography : ME. 1989 : Cambridge, 26.09.89-28.09.89 /
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“...FGME - Microlithography...”
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Electron beam, x-ray, and ion beam techniques for submicrometer lithographies. 0005 : Santa-Clara, CA, 11.03.1986-12.03.1986 /
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“...FGME - Microlithography...”
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Optical microlithography 0005 : Santa-Clara, CA, 13.03.86-14.03.86 /
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Optical microlithography. 0004 : Santa-Clara, CA, 13.03.1985-14.03.1985 n/
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Electron beam interactions with solids for microscopy, microanalysis and microlithography : Pfefferkorn conference 0001 : Monterey, CA, 18.04.82-23.04.82 /c edited by D. F. Kyser
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6
Electron beam, x-ray, and ion beam techniques for submicrometer lithographies. 3 /
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Wagner, A.
1984
“...FGME - Microlithography...”
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7
Optical microlithography symposium. 0003 : Santa-Clara, CA, 14.03.1984-15.03.1984 : Technology for the next decade /
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“...FGME - Microlithography...”
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8
X-ray lithography and applications of soft X-rays to technology : Upton, NY, 19.10.83-20.10.83 /
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Microcircuit engineering. 1983 : Microcircuit engineering conference. 1983: proceedings : ME. 1983: proceedings : Cambridge, 25.09.1983-29.09.1983 /
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“...FGME - Microlithography...”
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10
Submicron lithography : Santa-Clara, CA, 29.03.1982-30.03.1982 /
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11
Semiconductor Microlithography Seminar. 0006 : San-Jose, CA, 30.03.1981-31.03.1981 /
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Dey, J.
1981
“...FGME - Microlithography...”
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12
Developments in semiconductor microlithography: seminar . 2 : San-Jose, CA, 04.04.1977-05.04.1977 /
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