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Relation between growth rate, material quality, and device grade condition for intrinsic microcrystalline silicon : from layer investigation to the application to thin-film tandem solar-cells /
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15th European Workshop on Metalorganic Vapour Phase Epitaxy (EWMOVPE XV) : June 2-5, 2013, Aachen, Germany /
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Metallorganische chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung /
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PACVD of TiN /
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CVD main concepts, applications and restrictions /
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