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1
Book
Silizide der Ãœbergangsmetalle als Diffusionsquellen zur Erzeugung flacher Dotierungsgebiete in der VLSI-Technologie.
Probst, V.
1991
“
...
FGMH
-
Metallization
,
physics
of
microelectronics
...
”
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Probst, V.
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VLSI technology
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silicide
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FGMH - Metallization, physics of microelectronics
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