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FGMH - Metallization, physics of microelectronics
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FGMH - Metallization, physics of microelectronics
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1
Book
Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications /
Schmitz, John E. J.
1992
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FGKF
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Chemical
vapor
deposition
...
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2
Book
Chemical perspectives of microelectronics materials. 0002 : Biennial Meeting of Chemical Perspectives of Microelectronic Materials : 0002: proceedings : Materials Research Society...
Interrante, L. V.
1991
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Chemical
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3
Book
Chemical perspectives of microelectronic materials: symposium: proceedings : Materials Research Society fall meeting. 1988 : Boston, MA, 30.11.88-01.12.88.
Gross, M. E.
1989
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Chemical
vapor
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...
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3
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2
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ZB
3
Name
Gross, M. E.
1
Interrante, L. V.
1
Schmitz, John E. J.
1
Subject
VLSI technology
1
chemical vapor deposition
1
compound semiconductor
1
gallium arsenide
1
metallic film
1
metallization
1
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microelectronics
1
semiconductor epitaxy
1
semiconductor processing
1
semiconductor surface
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silicide
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silicon
1
surface chemistry
1
tungsten
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FGKF - Chemical vapor deposition
3
FGMH - Metallization, physics of microelectronics
FAF - Materials research - comprehensive works
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