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FGKJ - Plasma processing, etching

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FGKJ - Plasma processing, etching

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Books & more: Hits 21 - 40 of 92

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Book

Field assisted sintering of yttria ceramics for plasma etching applications /

Kindelmann, Moritz
2021

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Glow discharge processes : sputtering and plasma etching /

Chapman, Brian N.
1980

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La gravure seche et le depot plasma en microelectronique: symposium international. 0003 : Cachan, 26.11.1985-29.11.1985.

1985

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Großflächige Plasmaabscheidung von mikrokristallinem Silizium für mikromorphe Dünnschichtsolarmodule [E-Book] /

Kilper, Thilo
2009

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Großflächige Plasmaabscheidung von mikrokristallinem Silizium für mikromorphe Dünnschichtsolarmodule /

Kilper, Thilo
2009

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Halbleiterätzverfahren: Kinetik, Verfahrensgrundlagen und Anwendungsgebiete von nasschemischen Ätzverfahren für Silizium, Galliumarsenid, Galliumphosphid und Indiumphosphid.

Loewe, H.
1990

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Handbook of advanced plasma processing techniques /

Shul, R. J.
2000

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Handbook of plasma immersion ion implantation and deposition /

Anders, Andre
2000

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Handbuch der metallographischen Ätzverfahren : 90 Tabellen /

Beckert, M.
1976

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High energy density technologies in materials science. 2 : IGD Scientific Workshop : proceedings : Novara, 03.05.88-04.05.88.

Garbassi, F.
1990

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In situ patterning: selective area deposition and etching: symposium : Boston, MA, 29.11.89-01.12.89.

Bernhardt, A. F.
1990

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Industrial plasma engineering. 2. Applications to nonthermal plasma processing /

Roth, J. Reece.
2001

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Industrial plasma technology : applications from environmental to energy technologies /

Kawai, Yoshinobu
2010

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International Conference Ion and Plasma Assisted Techniques. 5 : (IPAT 1985) : München, 13.05.1985-15.05.1985.

Oechsner, H.
1985

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International Conference Ion and Plasma Assisted Techniques. 7 : IPAT 1989 : Geneve, 05.89.

1989

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International metal spraying conference 0007 vol 0001: papers : Conference international de metallisation 0007 vol 0001: papers : London, 10.09.73-15.09.73.

1974

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International metal spraying conference 0007 vol 0002: proceedings : Conference internationale de metallisation 0007 vol 0002: proceedings : London, 10.09.73-14.09.73.

1974

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Internationale Tagung Verschleissschutz und Korrosionsschutz durch ionengestuetzte und plasmagestuetzte Vakuumbeschichtungstechnologien (PVD Verfahren) : Darmstadt, 15.03.1983-16.0...

Kloos, K. H.
1983

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Ion implantation and plasma assisted processes : proceedings of the Conference on Ion Implantation and Plasma Assisted Processes for Industrial Applications, Atlanta, Georgia, 22-2...

Hochman, Robert F.
1988

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Die Ionenätzung als Mittel zur Oberflächenuntersuchung : Schweizerische Gesellschaft für Vakuumphysik und -technik : Vortragstagung. 0003 : Lausanne, 30.05.63-31.05.63.

Wegmann, L.
1964

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Print Edition 83 Electronic Edition 8

Book 92

Conference Publication 33 Theses 11 Handbook, Textbook 6 Report 1

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ZB 88 IEK-4 5 IBN-1-2 3 IFF 3 IBN-3-4 1 IEK-5 1 more ... INM-5 1 see all ... less ...

Apelian, Diran 2 Broszeit, E. 2 Flamm, Daniel L. 2 Heimann, R. B. 2 Kilper, Thilo 2 Pulker, H. K. 2 more ... Szekely, Julian 2 Zhou, Dapeng 2 Allen, Susan D. 1 Ambacher, Oliver 1 Anders, Andre 1 Annett, D. M. 1 Arata, Yoshiaki 1 Auciello, Orlando 1 Beckert, M. 1 Benko, B. 1 Bergmann, E. 1 Bernhardt, A. F. 1 Bock, F. 1 Bogenschütz, August Friedrich. 1 Bolt, Harald 1 Brauer, K. H. 1 Chang, R. P. 1 Chapman, Brian N. 1 Cheremisinoff, Paul N. 1 Coburn, J. W. 1 Collie, M. J. 1 D' Agostino, Riccardo. 1 Datta, Madhav 1 Dembovsky, V. 1 see all ... less ...

plasma processing 24 etching 20 plasma etching 16 plasma deposition 13 thin film technology 5 chemical vapor deposition 4 more ... coating 4 plasma arc spraying 4 plasma physics 4 silicon 4 electron beam processing 3 ion beam processing 3 ion implantation 3 laser processing 3 materials processing 3 sputter deposition 3 surface modification 3 III - V semiconductor 2 coating process 2 cold plasma 2 evaporation 2 film deposition 2 glow discharge 2 metal surface 2 plasma 2 plasma diagnostics 2 plasma wall interaction 2 semiconductor 2 silicon solar cell 2 spray coating 2 see all ... less ...

FGKJ - Plasma processing, etching FAF - Materials research - comprehensive works 8 FPU - Corrosion protection, surface coating 6 FGGE - Ion beam surface modification 5 FGJ - Laser and electron beam processing 5 FGK - Thin film technology, epitaxy 5 more ... FGKC - Vacuum deposition, MBE 5 FGM - Microelectronic technology 5 FPUG - Special purpose coatings 5 PGA - Plasma physics 4 FJKB - Elemental semiconductors 3 FPQ - Surface friction, hardness, wear, lubrication 3 CLD - High temperature chemistry, plasma chemistry 2 EISF - Thin film solar cells 2 FGGB - Ion implantation, ion beam synthesis 2 FGKF - Chemical vapor deposition 2 FHAB - Surface and thin film characterization 2 FJKC - III - V semiconductors 2 FMGE - Metallographic specimen preparation 2 FPUJ - Surface engineering 2 PGCC - Electric discharges in gases 2 CER - Macromolecular compounds - synthesis and reactions 1 FAQ - Materials research - institutions, research and development 1 FDCD - Dislocations 1 FFP - Physics of thin films 1 FGA - Materials processing - general aspects 1 FGCD - Crystal growth of specific substances 1 FGCK - Crystal technology 1 FGG - Ion beam technology 1 FGT - Microtechnology 1 see all ... less ...

English 14 German 12

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