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Theses
FGK - Thin film technology, epitaxy
epitaxy
Ratz, Günter.
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Theses
FGK - Thin film technology, epitaxy
epitaxy
Ratz, Günter.
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Niedertemperatur-Silicium-Epitaxie durch plasmaunterstützte chemische Abscheidung aus der Gasphase /
Ratz, Günter.
1995
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Ratz, Günter.
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epitaxy
silicon
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FGK - Thin film technology, epitaxy
FJKB - Elemental semiconductors
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