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1

Contribution to a book

Liquid injection MOCVD grown binary oxides and ternary rare-earth oxide as alternate gate-oxides for logic devices

Thomas, R.
2010

“...Thomas, R....”

2

Journal Article

Synthesis and characterisation of zirconium–amido guanidinato complex: a potential precursor for ZrO2 thin films

Devi, A.
2007

Dalton transactions (2007) S. 1671 - 1676

“...Thomas, R....”

3

Journal Article

Thin Films of HfO2 for High-k Gate Oxide Applications from Engineered Alkoxide- and Amide-Based MOCVD Precursors

Thomas, R.
2007

Journal of the Electrochemical Society, 154 (2007) S. G77 - G84

“...Thomas, R....”

4

Journal Article

Thin Films of ZrO2 for High-k Applications Employing Engineered Alkoxide- and Amide-Based MOCVD Precursors

Thomas, R.
2007

Chemical vapor deposition, 13 (2007)

“...Thomas, R....”

5

Journal Article

Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2

Milanov, A.
2006

Inorganic chemistry, 45 (2006) S. 11008 - 11018

“...Thomas, R....”

6

Journal Article

Liquid injection MOCVD of ZrO2 thin films using a novel zirconium Bis(diethylamido)-bis(di-tert-butylmalonato) as a novel precursor

Thomas, R.
2006

Chemical vapor deposition, 12 (2006) S. 295 - 300

“...Thomas, R....”

7

Journal Article

MOCVD of ZrO2 and HfO2 Thin Films from Modified Monomeric Precursors

Patil, U.
2006

Chemical vapor deposition, 12 (2006) S. 172

“...Thomas, R....”

8

Journal Article

Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

Milanov, A.
2006

Journal of materials chemistry, 16 (2006) S. 437

“...Thomas, R....”

9

Conference Presentation

Zirconium dioxide thin films for high-K applications by MOCVD from novel mononuclear precursors

Thomas, R.
2005

“...Thomas, R....”

10

Contribution to a book
Contribution to a conference proceedings

Zirconium dioxide thin films for high-K applications by MOCVD from novel mononuclear precursors

Thomas, R.
2005

“...Thomas, R....”

11

Journal Article

High-k dielectric materials by metalorganic chemical vapor deposition: growth and characterization

Thomas, R.
2005

Ferroelectrics, 327 (2005) S. 111

“...Thomas, R....”

12

New tailored precursors for the MOCVD of group IVB metal oxides: high-k application

Thomas, R.
2005

“...Thomas, R....”

13

Journal Article

MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri)2(tbaoac)2]

Bhakta, R.
2004

Journal of materials chemistry, 14 (2004) S. 3231 - 3238

“...Thomas, R....”

14

Journal Article

Mononuclear precursor for MOCVD of HfO2 thin films

Baunemann, A.
2004

Chemical communications (2004) S. 1610 - 1611

“...Thomas, R....”
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