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Hoffmann-Eifert, S.
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Reiner, M.
Elektronische Materialien; PGI-7
Grundlagen für zukünftige Informationstechnologien
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Hoffmann-Eifert, S.
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Reiner, M.
Elektronische Materialien; PGI-7
Grundlagen für zukünftige Informationstechnologien
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1
Conference Presentation
Atomic layer deposition of TiO2 by TDMAT and H2O for resistive switching applications
Reiner, M.
2012
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Atomic layer deposition of TiO2-x thin films for resistive switching devices
Reiner, M.
2012
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Journal Article
Relation between enhancement in growth and thickness-dependent crystallization in ALD TiO2 thin films
Kim, S.K.
2011
Journal of the Electrochemical Society, 158 (2011) S. D6 - D9
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Hoffmann-Eifert, S.
Reiner, M.
Waser, R.
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Aslam, N.
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Kim, S.K.
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Grundlagen für zukünftige Informationstechnologien
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