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1
Journal Article
Study of the relaxation of strain in patterned Si/SiGe structures using an x-ray diffraction technique
Khan
,
A
.
R
.
2007
Semiconductor science and technology, 22 (2007) S. s212 - s215
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Study of Relaxation of Strain in Patterned Structures using X-Ray Diffraction Technique
Khan
,
A
.
R
.
2006
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Poster
Study of Relaxation of Strain in Patterned Structures using X-Ray Diffraction Technique
Khan
,
A
.
R
.
2006
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,
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.
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3
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Contribution to a book
1
Contribution to a conference proceedings
1
Journal Article
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Poster
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Bauer, G.
3
Buca, Dan Mihai
3
Caymax, M.
3
Holländer, Bernhard
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Khan, A. R.
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Loo, R.
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Mantl, S.
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Stangl, J.
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Trinkaus, H.
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Research Program
Grundlagen für zukünftige Informationstechnologien
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Contributing Institute
Center of Nanoelectronic Systems for Information Technology; CNI
3
Institut für Halbleiterschichten und Bauelemente; ISG-1
2
Theorie III; IFF-TH-III
2
Halbleiter-Nanoelektronik; IBN-1
1
JARA-FIT; JARA-FIT
1
Scientific Report
2006
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2007
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