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1

Journal Article

Homogeneous NiSi1−xGex layer formation on strained SiGe with ultrathin Ni layers

Liu, Linjie
2015

Microelectronic engineering, 139 (2015) S. 26 - 30

2

Journal Article

SiGeSn growth studies using reduced pressure chemical vapor deposition towards optoelectronic applications

Wirths, S.
2014

Thin solid films, 557 (2014) S. 183 - 187

3

Conference Presentation

Epitaxial growth studies of SiGe and SiGeSn

Wirths, S.
2013

4

Conference Presentation

Growth of graded doped Si/SiGe Heterostructure Tunnel FET

Wirths, S.
2013

5

Conference Presentation

SiGeSn Growth Studies using Reduced Pressure CVD Towards Optoelectronic Applications

Wirths, Stephan
2013

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6

Journal Article

Low temperature RPCVD epitaxial growth of Si1−xGex using Si2H6 and Ge2H6

Wirths, Stephan
2013

Solid state electronics, 83 S. 2 - 9

7

Journal Article

Tensely strained GeSn alloys as optical gain media

Wirths, S.
2013

Applied physics letters, 103 (2013) 19, S. 192110 -

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