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Center of Nanoelectronic Systems for Information Technology; CNI
Conference Presentation
Grundlagen für zukünftige Informationstechnologien
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Center of Nanoelectronic Systems for Information Technology; CNI
Conference Presentation
Grundlagen für zukünftige Informationstechnologien
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Conference Presentation
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Conference Presentation
Asymmetric biaxial stress in patterned Si/SiGe structures after ion beam induced strain relaxation
Mantl, S.
2006
“
...
Theorie
III
;
IFF
-
TH
-
III
Theorie III...
”
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2
Conference Presentation
Fabrication and Characterisation of patterned SiGe/Si lines with asymmetric biaxial stress
Buca, D.
2006
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Theorie
III
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IFF
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TH
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III
Theorie III...
”
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3
Conference Presentation
Ion channeling investigation of patterned Si/SiGe lines with asymmetric biaxial stress
Holländer, B.
2006
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Theorie
III
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IFF
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TH
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III
Theorie III...
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Conference Presentation
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Buca, Dan Mihai
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Feste, S.
3
Holländer, Bernhard
3
Mantl, S.
3
Trinkaus, H.
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Caymax, M.
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Research Program
Grundlagen für zukünftige Informationstechnologien
Contributing Institute
Center of Nanoelectronic Systems for Information Technology; CNI
Institut für Halbleiterschichten und Bauelemente; ISG-1
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Theorie III; IFF-TH-III
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2006
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