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Elektronische Materialien; IFF-IEM
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Mikrostrukturforschung; IFF-IMF
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Center of Nanoelectronic Systems for Information Technology; CNI
Ehrhart, P.
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Elektronische Materialien; IFF-IEM
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Mikrostrukturforschung; IFF-IMF
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Center of Nanoelectronic Systems for Information Technology; CNI
Ehrhart, P.
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1
Journal Article
Dysprosium scandate thin films as an alternate amorphous gate oxide prepared by metal-organic chemical vapor deposition
Thomas, R.
2006
Applied physics letters, 89 (2006) S. 232902
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2
Journal Article
Comparison of precursors for pulsed metal-organic chemical vapor deposition of HfO2 high-k dielectric thin films
Teren, A. R.
2005
Thin solid films, 478 (2005) S. 206
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3
Conference Presentation
MOCVD of SrTa2O6 thin films for high-k applications
Regnery, S.
2004
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4
Conference Presentation
Nucleation and growth of thin (Ba,Sr)TiO films during MOCVD on Pt and Si surfaces
Regnery, S.
2004
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Journal Article
(Ba,Sr)TiO3 thin film growth in a batch processing MOCVD reactor
Regnery, S.
2003
Journal of the European Ceramic Society, 24 (2003) S. 271-276
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Waser, R.
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He, J.
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Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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Elektronische Materialien; IFF-IEM
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