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2009
Waser, R.
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Kim, S. K.
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2009
Waser, R.
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Kim, S. K.
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Conference Presentation
Liquid injection atomic layer deposition of metallic Ru thin films from Ru(tmhd)3 and of high-k TiO2 thin films from Ti(O-i-Pr)2(tmhd)2
Hoffmann-Eifert, S.
2009
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Conference Presentation
Liquid injection atomic layer deposition of metallic Ru and RuO2 thin films for electrode applications
Hoffmann-Eifert, S.
2009
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Journal Article
Liquid injection atomic layer deposition of crystalline TiO2 thin films with a smooth morphology from Ti(O-i-Pr)2(DPM)2
Kim, S. K.
2009
Journal of the Electrochemical Society, 156 (2009) S. D296 - D300
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Journal Article
Growth of noble metal Ru thin films by liquid injection atomic layer deposition
Kim, S. K.
2009
The @journal of physical chemistry
/ C, 113 (2009) S. 11329
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Conference Presentation
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Journal Article
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Hoffmann-Eifert, S.
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Kim, S. K.
Waser, R.
Mi, S.
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Grundlagen für zukünftige Informationstechnologien
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Elektronische Materialien; IFF-6
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JARA-FIT; JARA-FIT
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Mikrostrukturforschung; IFF-8
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