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1
Journal Article
Liquid injection MOCVD of ZrO2 thin films using a novel zirconium Bis(diethylamido)-bis(di-tert-butylmalonato) as a novel precursor
Thomas, R.
2006
Chemical vapor deposition, 12 (2006) S. 295 - 300
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2
Journal Article
MOCVD of ZrO2 and HfO2 Thin Films from Modified Monomeric Precursors
Patil
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U
.
2006
Chemical vapor deposition, 12 (2006) S. 172
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3
Conference Presentation
Zirconium dioxide thin films for high-K applications by MOCVD from novel mononuclear precursors
Thomas, R.
2005
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Zirconium dioxide thin films for high-K applications by MOCVD from novel mononuclear precursors
Thomas, R.
2005
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5
Poster
New tailored precursors for the MOCVD of group IVB metal oxides: high-k application
Thomas, R.
2005
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6
Journal Article
High-k dielectric materials by metalorganic chemical vapor deposition: growth and characterization
Thomas, R.
2005
Ferroelectrics, 327 (2005) S. 111
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6
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Journal Article
3
Conference Presentation
1
Contribution to a book
1
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1
Poster
1
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Devi, A.
6
Ehrhart, P.
6
Patil, U.
6
Thomas, R.
6
Waser, R.
6
Bhakta, R.
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Milanov, A.
2
Winter, M.
2
Becker, H.-W.
1
Becker, R.
1
Fischer, R. A.
1
Merz, K.
1
Regnery, S.
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Research Program
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
4
Grundlagen für zukünftige Informationstechnologien
2
Contributing Institute
Center of Nanoelectronic Systems for Information Technology; CNI
6
Elektronische Materialien; IFF-IEM
6
Scientific Report
2005
4
2006
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