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Conference Presentation
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Journal Article
Comparison of precursors for pulsed metal-organic chemical vapor deposition of HfO2 high-k dielectric thin films
Teren
,
A
.
R
.
2005
Thin solid films, 478 (2005) S. 206
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Conference Presentation
Comparison of hafnium precursors for the MOCVD of HfO2 for gate dielectric applications
Teren
,
A
.
R
.
2003
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2
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Conference Presentation
1
Journal Article
1
Name
Ehrhart, P.
2
Teren, A. R.
2
Baumann, P. K.
1
He, J.
1
He, J. Q.
1
Jia, C. L.
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Jones, A. C.
1
Leedham, T. J.
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Lindner, J.
1
Rushworth, S. R.
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Schumacher, M.
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Thomas, R.
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Waser, R.
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Research Program
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
2
Contributing Institute
Mikrostrukturforschung; IFF-IMF
2
Center of Nanoelectronic Systems for Information Technology; CNI
1
Elektrokeramische Materialien; IFF-EKM
1
Elektronische Materialien; IFF-IEM
1
Scientific Report
2003
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2005
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