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Improved NiSi contacts on Si by CF4 plasma immersion ion implantation for 14nm node MOSFETs
Zhang, Haitao
2015
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Homogeneous NiSi1−xGex layer formation on strained SiGe with ultrathin Ni layers
Liu
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Linjie
2015
Microelectronic engineering, 139 (2015) S. 26 - 30
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Controlling Electron Charge-Based Phenomena
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Halbleiter-Nanoelektronik; PGI-9
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