Thin film processes / edited by John L. Vossen, Werner Kern.
Thin film processes
Saved in:
Personal Name(s): | Vossen, John L. |
---|---|
Kern, Werner. | |
Imprint: |
New York :
Academic Press,
1978.
|
Physical Description: |
xi, 564 p. |
Note: |
englisch |
ISBN: |
9780127282503 0127282505 |
Keywords: |
epitaxy : methodology review : sputtering : chemical vapor deposition : etching |
Classification: | |
Shelf Classification: |
LEADER | 01333cam a2200349 n 4500 | ||
---|---|---|---|
001 | 2892 | ||
005 | 19970422000000.0 | ||
008 | r1978 | ||
020 | |a 0127282505 | ||
035 | |a (Sirsi) a12900 | ||
084 | 0 | |a FGK - Thin film technology, epitaxy |2 ZB | |
084 | 1 | |a FGK - Dünnfilmtechnologie, Epitaxie |2 LS | |
245 | 0 | 0 | |a Thin film processes / |c edited by John L. Vossen, Werner Kern. |
260 | |a New York : |b Academic Press, |c 1978. | ||
300 | |a xi, 564 p. | ||
500 | |a englisch | ||
520 | |a Thin film processes | ||
520 | |a physical methods of film deposition | ||
520 | |a chemical methods of film deposition | ||
520 | |a physicochemical methods of film depostion | ||
520 | |a etching | ||
596 | |a 1 28 89 | ||
653 | |a epitaxy : methodology | ||
653 | |a review : sputtering : chemical vapor deposition : etching | ||
700 | 1 | |a Vossen, John L. | |
700 | 1 | |a Kern, Werner. | |
900 | |a B 047305'01' | ||
900 | |a FGK 008 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a B 047305'01' |w LC |c 1 |i 1083002977 |d 22/4/1997 |l STACKS |m IKP |r Y |s Y |t INSTB |u 25/3/2009 |x INST-F |1 PRINT | ||
949 | |a FGK 008 |w LC |c 1 |i 1079000968 |d 6/12/2017 |e 29/11/2017 |l STACKS |m ZB |n 6 |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT | ||
949 | |a B 047305'01' |w LC |c 1 |i 1079003795 |d 22/4/1997 |l STACKS |m IEK-4 |r Y |s Y |t INSTB |u 25/3/2009 |x INST-F |1 PRINT |