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Semiconductor nanostructures /
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Nanocomposite thin films and coatings : processing, properties and performance /
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Zhang, Sam
2007
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MOCVD of high-K ceramic thin films for the Gbit DRAM technology [E-Book] /
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Supercritical Si(1-x)Ge(x)alloy layers for optoelectronic applications grown by athmospheric pressure chemical vapor deposition [E-Book] /
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Low-dimensional semiconductor structures : fundamentals and device applications /
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Beurteilung der optischen Eigenschaften von AlGaInP hergestellt in der metallorganischen Gasphasenepitaxie unter Stickstoff- oder Wasserstoffatmosphäre [E-Book] /
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Allotaxie: ein neues Verfahren zur Herstellung von Eisendisilizid- und Siliziumdioxid-Heterostrukturen in Silizium [E-Book] /
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Growth, processing, and characterization of semiconductor heterostructures: symposium : MRS fall meeting 1993: symposium M: proceedings : Boston, MA, 29.11.93-01.12.93.
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Gumbs, G.
1994
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Growth of semiconductor structures and high TC thin films on semiconductors: proceedings : San-Diego, CA, 20.03.90-21.03.90.
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Pseudomorphe Indium Gallium Arsenid/Gallium(Aluminium)Arsenid Heterostrukturen: Wachstum und Charakterisierung.
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Heterostructures on silicon: one step further with silicon : NATO advanced research workshop on heterostructures on silicon: one step further with silicon: proceedings : Cargese, 15.05.88-20.05.88.
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Heteroepitaxy on silicon: fundamentals, structure, and devices: symposium : Materials Research Society spring meeting. 1988 : Reno, NV, 05.04.88-08.04.88.
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Silicon on insulator and buried metals in semiconductors: symposium : Boston, MA, 30.11.87-03.12.87.
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Heteroepitaxy on silicon. 0002 : Symposium on Heteroepitaxy on Silicon Technology: papers : Materials Research Society Spring Meeting : 1987 : Anaheim, CA, 21.04.87-23.04.87.
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Fan, J. C.
1987
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Heteroepitaxy on silicon : Heteroepitaxy on silicon: symposium. 0001 : Palo-Alto, CA, 16.04.86-18.04.86.
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Epitaxial silicon technology /
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Semiconductor on insulator and thin film transistor technology: symposium : Boston, MA, 03.12.85-06.12.85.
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Chiang, A.
1986
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Silicon on insulator: its technology and applications : United States Japan seminar on solid phase epitaxy and interface kinetics : Oiso, 20.06.1983-24.06.1983.
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Halbleiterepitaxie /
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Characterization of epitaxial semiconductor films.
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