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Metal based thin films for electronics /
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Handbook of thin film devices. 4. Magnetic thin film devices /
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Handbook of thin film devices. 5. Ferroelectric film devices /
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Interconnects in VLSI design /
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Silicon VLSI technology : fundamentals, practice and modeling /
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Handbook of semiconductor manufacturing technology /
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Handbook of thin film devices. 1. Hetero-structures for high performance devices /
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Low and high dielectric constant materials. Thin film materials for advanced packaging technologies : materials science, processing and reliability issues : proceedings of the Fourth International Symposium [on Low and High Dielectric Constant Materials] : proceedings of the Second International Symposium [on Thin Film Materials for Advanced Packaging] /
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Singh, R.
1999
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Multicomponent oxide films for electronics : symposium held April 6-8, 1999, San Francisco, California, U.S.A. /
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Ultrathin SiO2 and high-K materials for ULSI gate dielectrics : symposium held April 5 - 8, 1999, San Francisco, California, USA [at the 1999 MRS spring meeting] /
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Herstellung, Charakterisierung und Optimierung von Hoch-Tc-Stufenkontakten : Entwicklung waferskalierter aktiver supraleitender Bauelemente und hochfrequenztauglicher Josephson-Kontakte [E-Book] /
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Untersuchung von oxidischen Isolationsmaterialien in heteroepitaktischen Bauelementen auf der Basis von Hochtemperatursupraleitern [E-Book] /
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Oberflächeninduzierte Abscheidung von Siliziumdioxid aus der Gasphase /
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Materials issues in vacuum microelectronics : symposium held April 13-16, 1998, San Francisco, California, USA : [MRS Symposium on Materials Issues inVacuum Microelectronics ] /
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Zhu, Wei
1998
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Materials science in microelectronics. 2. The effects of structure on properties in thin films /
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Entwicklung und Charakterisierung vertikaler Silizium-Feldeffekttransistoren auf der Basis selektiver Epitaxie [E-Book] /
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Low and high dielectric constant materials : materials science, processing and reliability issues : proceedings of the Second International Symposium [on Low and High Dielectric Constant Materials] /
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Untersuchung der Facettenbildung bei selektiver Epitaxie von Si mittels LPCVD [E-Book] /
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Modeling of film deposition for microelectronic applications.
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ULSI technology /
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