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FGKJ - Plasma processing, etching
thin film technology
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FGKJ - Plasma processing, etching
thin film technology
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1
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Industrial plasma technology : applications from environmental to energy technologies /
Kawai, Yoshinobu
2010
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2
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Plasma sources for thin film deposition and etching.
Francombe, M. H.
1994
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Principles of plasma discharges and materials processing /
Lichtenberg, Allan J.
2005
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Vakuumbeschichtung Vol 0001: Plasmaphysik, Plasmadiagnostik, Analytik.
Frey, H.
1995
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5
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Wachstumsmechanismen bei der plasmagestuetzten Abscheidung von Kohlenwasserstoffschichten, eine in situ Ellipsometriestudie.
Keudell, Achim von.
1996
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5
IEK-4
1
Name
Francombe, M. H.
1
Frey, H.
1
Kawai, Yoshinobu
1
Keudell, Achim von.
1
Lichtenberg, Allan J.
1
Lieberman, Michael E.
1
Subject
thin film technology
ion implantation
2
plasma etching
2
plasma physics
2
biological aspect
1
chemical vapor deposition
1
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cold plasma
1
discharge
1
ellipsometry
1
environmental impact
1
flow distribution
1
gas flow
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plasma
1
plasma deposition
1
plasma diagnostics
1
solar cell
1
surface analysis
1
thin film physics
1
vacuum deposition
1
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Classification
FGKJ - Plasma processing, etching
PGA - Plasma physics
2
CLD - High temperature chemistry, plasma chemistry
1
FFP - Physics of thin films
1
FGK - Thin film technology, epitaxy
1
FGKC - Vacuum deposition, MBE
1
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