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Breuer, U.
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Holländer, Bernhard
JARA-FIT; JARA-FIT
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Breuer, U.
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Holländer, Bernhard
JARA-FIT; JARA-FIT
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1
Journal Article
Atomic layer deposition of HfO2 and Al2O3 layers on 300 mm Si wafers for gate stack technology
Lupták, R.
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A301
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2
Contribution to a book
High temperature implantation: a solution for N-type junctions in strained silicon
Heiermann, W.
2009
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3
Talk (non-conference)
High temperature implantation: a solution for N-type junctions in strained silicon
Heiermann, W.
2009
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4
Journal Article
High temperature antimony ion implantation in strained silicon-on-insulator
Buca, D.
2009
Solid state electronics, 53 (2009) S. 828 - 832
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Journal Article
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Contribution to a book
1
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1
Name
Breuer, U.
Holländer, Bernhard
Buca, Dan Mihai
3
Heiermann, W.
3
Trinkaus, H.
3
Ghyselen, B.
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Mantl, M.
2
Mantl, S.
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Baumann, P.K.
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Besmehn, A.
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Dürgün-Özben, Eylem
1
Feste, S.
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Habicht, S.
1
Heuken, M.
1
Lenk, Steffi
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Lopes, J.M.J.
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Lupták, R.
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Schnee, M.
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Schubert, Jürgen
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Tiedemann, Andreas
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Research Program
Grundlagen für zukünftige Informationstechnologien
4
Contributing Institute
Halbleiter-Nanoelektronik; IBN-1
4
JARA-FIT; JARA-FIT
Halbleiter-Nanoelektronik; PGI-9
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