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Moers, J.
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Trellenkamp, Stefan
Grundlagen für zukünftige Informationstechnologien
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Moers, J.
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Trellenkamp, Stefan
Grundlagen für zukünftige Informationstechnologien
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2
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Select result number 1
1
Journal Article
Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography
Brose, S.
2012
Thin solid films, 520 (2012) S. 5080 - 5085
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2
Poster
Optimised marker definition for high overlay accuracy e-beam lithography
Moers, J.
2011
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3
Journal Article
Influence of the epitaxial growth and device processing on the overlay accuracy during processing of the d-DotFET
Moers, J.
2010
Thin solid films, 518 (2010) S. 2565 - 2568
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4
Journal Article
Gate-controlled Quantum collimation in nanocolumn resonant tunnelling transistors
Wensorra, J.
2009
Nanotechnology, 20 (2009) S. 465402
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5
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The disposable DotFET: A strained silicon channel on top of removed SiGe
Gerharz, J.
2009
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6
Conference Presentation
The disposable Dot Field Effect Transistor: Process flow and overlay requirements
Moers, J.
2008
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7
Conference Presentation
The disposable DotField Effect Transistor
Moers, J.
2008
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8
Poster
The disposable Dot Field Effect Transistor
Gerharz, J.
2008
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9
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The disposable Dot Field Effect Transistor: Process flow and overlay requirements
Moers, J.
2008
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9
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Journal Article
3
Conference Presentation
2
Contribution to a book
2
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2
Poster
2
Name
Moers, J.
Trellenkamp, Stefan
Grützmacher, Detlev
7
Gerharz, J.
6
Mussler, G.
2
Rinke, G.
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von der Hart, A.
2
Bergmann, K.
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Brose, S.
1
Danylyuk, S.
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Dittberner, C.
1
Indlekofer, K. M.
1
Juschkin, L.
1
Lepsa, M. I.
1
Loosen, P.
1
Lüth, H.
1
Panaitov, Gregory
1
Rienks, B.
1
Wensorra, J.
1
v.d.Hart, A.
1
van der Hart, A.
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Grundlagen für zukünftige Informationstechnologien
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JARA-FIT; JARA-FIT
7
Halbleiter-Nanoelektronik; IBN-1
6
Prozesstechnologie; IBN-PT
6
Bioelektronik; PGI-8
2
Center of Nanoelectronic Systems for Information Technology; CNI
2
Halbleiter-Nanoelektronik; PGI-9
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Grenz- und Oberflächen; IBN-3
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