JuLib | Articles & more - {"Minamisawa, R. A."}

1

Journal Article

p-Type Ion Implantation in Tensile Si/Compressive Si0.5Ge0.5/Tensile Strained Si Heterostructures

Minamisawa, R.A.
2012

Journal of the Electrochemical Society, 159 (2012) S. H44 - H51

“...Minamisawa, R.A....”

2

Journal Article

Anisotropy of strain relaxation in (100) and (110) Si/SiGe heterostructures

Trinkaus, H.
2012

Journal of applied physics, 111 (2012) S. 014904

“...Minamisawa, R.A....”
Get full text Published under German "Allianz" Licensing conditions on 2012-01-05. Available in OpenAccess from 2012-01-05

3

Journal Article

Impact of strain and Ge concentration on the performance pf planar SiGe band-to-band-tunneling transistors

Schmidt, M.
2012

Solid state electronics, 71 (2012) S. 42 - 47

“...Minamisawa, R.A....”

4

Journal Article

Hole Transport in Strained Si0.5Ge0.5 QW-MOSFETs with <110> and <100> Channel Orientations

Minamisawa, R.A.
2012

IEEE electron device letters, 33 (2012) S. 1105 - 1107

“...Minamisawa, R.A....”

5

Journal Article

Unipolar behavior of asymmetrically doped strained Si 0.5Ge 0.5 tunneling field-effect transistors

Schmidt, Matthias
2012

Applied physics letters, 101 (2012) 12, S. 123501

“...Minamisawa, R. A....”
Published under German "Allianz" Licensing conditions on 2012-09-17. Available in OpenAccess from 2012-09-17

6

Contribution to a book
Contribution to a conference proceedings

Impact of strain and Ge concentration on the performance of planar SiGe band-to-band-tunneling transistors

Schmidt, M.
2011

“...Minamisawa, R.A....”

7

Conference Presentation

Impact of strain and Ge concentration on the performance of planar SiGe band-to-band-tunneling transistors

Schmidt, M.
2011

“...Minamisawa, R.A....”

8

Journal Article

Silicon Nanowire Tunneling Field-Effect Transistor Arrays: Improving Subthreshold Performance Using Excimer Laser Annealing

Smith, J.T.
2011

IEEE Transactions on Electron Devices, 58 (2011) S. 1822 - 1829

“...Minamisawa, R.A....”

9

Journal Article

High mobility strained Si(0.5)Ge(0.5)/SSOI short channel field effect transistors with TiN/GdScO(3) gate stack

Minamisawa, R.A.
2011

Microelectronic engineering, 88 (2011) S. 2955 - 2958

“...Minamisawa, R.A....”

10

Journal Article

Elastic strain and dopant activation in ion implanted strained Si nanowires

Minamisawa, R.A.
2010

Journal of applied physics, 108 (2010) S. 124908

“...Minamisawa, R.A....”
Get full text OpenAccess OpenAccess

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