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2009
Contribution to a conference proceedings
Zhao, Q. T.
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2009
Contribution to a conference proceedings
Zhao, Q. T.
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1
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Performance enhancement of uniaxially-tensile strained Si NW-nFETs fabricated by lateral strain relaxation of SSOI
Feste, S. F.
2009
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2
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Ultra thin Ni-silicides with low contact resistance on SOI and strained-SOI
Knoll, L.
2009
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3
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Interfacial and electrical characterization of HfO2 gate dielectric film with a blocking layer of Al2O3
Cheng, X.
2009
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High-Frequency Performance of Dopant-Segregated NiSi S/D SOI SB-MOSFETs
Urban, C.
2009
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5
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High performance Schottky barrier MOSFETs on UTB SOI
Urban, C.
2009
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6
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Schottky-barrier height tuning og Ni and Pt germanide/n-Ge contacts using dopant segregation
Müller, M.
2009
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7
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Self-Organized Si-Nanotransistors
Reiche, M.
2009
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8
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Strained and Unstrained Si Nanowire FETs
Feste, S. F.
2009
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8
Document Type
Contribution to a book
8
Contribution to a conference proceedings
Name
Zhao, Q. T.
Mantl, S.
7
Urban, C.
4
Buca, Dan Mihai
3
Habicht, S.
3
Sandow, C.
3
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Feste, S. F.
2
Breuer, U.
1
Cheng, X.
1
Emam, M.
1
Fox, A.
1
Ghyselen, B.
1
Gösele, U.
1
Haehnel, A.
1
He, D.
1
Kittler, M.
1
Knoch, J.
1
Knoll, L.
1
Müller, M.
1
Raskin, J.P.
1
Reiche, M.
1
Shen, D.
1
Song, Z.
1
Yu, Y.
1
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Research Program
Grundlagen für zukünftige Informationstechnologien
8
Contributing Institute
Halbleiter-Nanoelektronik; IBN-1
8
JARA-FIT; JARA-FIT
7
Scientific Report
2009
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