1
Handbook of advanced plasma processing techniques /
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Proceedings of the Eleventh International Symposium on Plasma Processing : [held in Los Angeles, CA, May 5-10, 1996 .... was held as part of the 189th meeting of the Electrochemial Society] /
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Proceedings of the symposium on high rate metal dissolution processes /
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Vakuumbeschichtung Vol 0002: Verfahren und Anlagen.
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Kienel, G.
1995
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Etching of III-V semiconductors : an electrochemical approach /
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Halbleiterätzverfahren: Kinetik, Verfahrensgrundlagen und Anwendungsgebiete von nasschemischen Ätzverfahren für Silizium, Galliumarsenid, Galliumphosphid und Indiumphosphid.
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Loewe, H.
1990
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In situ patterning: selective area deposition and etching: symposium : Boston, MA, 29.11.89-01.12.89.
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Etching of crystals : theory, experiment, and application /
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Laser assisted deposition, etching, and doping : Los-Angeles, CA, 26.01.1984-27.01.1984 /
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Dry etching for microelectronics.
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Silicon: chemical etching.
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Etching compositions and processes.
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Handbuch der metallographischen Ätzverfahren : 90 Tabellen /
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Etching for pattern definition: proceedings of the symposium : Electrochemical Society: spring meeting. 1976 : Washington, DC, 02.05.1976-07.05.1976.
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Elektrochemische Leiterplattenätzung mit geschlossenem Elektrolytkreislauf.
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Auflösung von Kristallen : Theorie und technische Anwendung /
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Die Resultate der Ätzmethode an Kristallen der Glimmergruppe.
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Ätzpraxis für Halbleiter /
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Der Einfluss der Versetzungsstruktur auf die Kristallaufloesung /
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Atomic layer processing : semiconductor dry etching technology /
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