1
Field assisted sintering of yttria ceramics for plasma etching applications /
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Principles of plasma discharges and materials processing /
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Low temperature plasma physics : fundamental aspects and applications /
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Plasma processes for semiconductor fabrications /
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Plasma sources for thin film deposition and etching.
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Plasma deposition, treatment, and etching of polymers /
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Kalte Plasmen : Grundlagen, Erscheinungen, Anwendungen /
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Plasma-surface interactions and processing of materials : NATO Advanced Study Institute on Plasma Surface Interactions and Processing of Materials: proceedings : Alicante, 04.09.88-16.09.88 /
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Plasma etching : an introduction /
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Plasma surface engineering vol 0001 : International conference on plasma surface engineering 0001: papers : Garmisch-Partenkirchen, 19.09.88-23.09.88.
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Plasma synthesis and etching of electronic materials : Symp : Boston, MA, 27.11.1984-30.11.1984.
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Plasma etching in semiconductor fabrication.
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Preparation and characterization : Film preparation and etching by plasma technology : international seminar : Brighton, 25.03.81-27.03.81.
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1981
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14
Plasma processing : Plasma etching and deposition: proceedings of the symposium : Electrochemical Society: spring meeting. 1980 : Saint-Louis, MO, 11.05.1980-16.05.1980.
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Glow discharge processes : sputtering and plasma etching /
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Plasma chemistry. 3.
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Veprek, S.
1980
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