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FGK - Thin film technology, epitaxy
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FGK - Thin film technology, epitaxy
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1
Book
Amorphous and heterogeneous silicon-based films 2002 : symposium held April 2 - 5, 2002, San Francisco, California, USA [during 2002 MRS spring meeting] /
Cohen, J. David
2002
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Elemental
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2
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Silicon epitaxy /
Crippa, Danilo
2001
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Amorphous and heterogeneous silicon thin films 2000 : symposium held April 24 - 28, 2000, San Francisco, California, USA /
Collins, Robert W.
2001
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Niedertemperatur-Silicium-Epitaxie durch plasmaunterstützte chemische Abscheidung aus der Gasphase /
Ratz, Günter.
1995
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5
E-Book
Inselwachstum von Übergangsmetallsiliziden auf Siliziumoberflächen [E-Book] /
Wohllebe, Andreas
1994
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Silicon processing : Symposium on silicon processing : San-Jose, CA, 19.01.82-22.01.82.
Gupta, D. C.
1983
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7
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Epitaktische Abscheidung von monokristallinem Silizium bei reduziertem Totaldruck.
Krullmann, Eike.
1981
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Available as
Print Edition
6
Electronic Edition
1
Material Type
Book
7
Type of Literature
Theses
3
Conference Publication
3
Year of Publication
From:
To:
Location
ZB
7
Name
Cohen, J. David
1
Collins, Robert W.
1
Crippa, Danilo
1
Gupta, D. C.
1
Krullmann, Eike.
1
Ratz, Günter.
1
more ...
Wohllebe, Andreas
1
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Subject
epitaxy
4
silicon
3
amorphous film
2
amorphous silicon
2
chemical vapor deposition
1
electronic structure
1
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metrology
1
modeling
1
molecular beam epitaxy
1
solid state device
1
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Classification
FGK - Thin film technology, epitaxy
FJKB - Elemental semiconductors
7
FJEC - Amorphous semiconductors
2
FGCD - Crystal growth of specific substances
1
Language
German
1
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