61
Radio frequency/radiation and plasma processing : industrial applications & advances /
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Plasma processing of materials /
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63
Plasma processing and synthesis of materials : Materials Research Society annual meeting. 1983 : Boston, MA, 14.11.1983-17.11.1983.
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Advances in thin film technology : Sputtering and etching : Materials Research Corporation : sputtering schools. 34 and 35 : Roma, Santa-Barbara, CA, 06.84 ; 11.84.
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Weinig, S.
1984
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Colloquium on plasma processing for semiconductors, gas discharge and surface aspects : London, 11.10.1984-11.10.1984.
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1984
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Plasma processing for VLSI.
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Dry etching for microelectronics.
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68
Laser assisted deposition, etching, and doping : Los-Angeles, CA, 26.01.1984-27.01.1984 /
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Internationale Tagung Verschleissschutz und Korrosionsschutz durch ionengestuetzte und plasmagestuetzte Vakuumbeschichtungstechnologien (PVD Verfahren) : Darmstadt, 15.03.1983-16.03.1983.
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Silicon: chemical etching.
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71
Etching compositions and processes.
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Ipat 1981 : Ion and plasma assisted techniques: international conference 3 : Amsterdam, 30.06.81-02.07.81.
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1981
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Preparation and characterization : Film preparation and etching by plasma technology : international seminar : Brighton, 25.03.81-27.03.81.
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1981
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74
Plasma processing : Plasma etching and deposition: proceedings of the symposium : Electrochemical Society: spring meeting. 1980 : Saint-Louis, MO, 11.05.1980-16.05.1980.
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Glow discharge processes : sputtering and plasma etching /
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Plasma chemistry. 3.
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Veprek, S.
1980
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Handbuch der metallographischen Ätzverfahren : 90 Tabellen /
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Elektrochemische Leiterplattenätzung mit geschlossenem Elektrolytkreislauf.
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Etching for pattern definition: proceedings of the symposium : Electrochemical Society: spring meeting. 1976 : Washington, DC, 02.05.1976-07.05.1976.
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Auflösung von Kristallen : Theorie und technische Anwendung /
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