Document Type within your search.
Document Type within your search.
1
Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
2
Nichau, A.
2012
2012
Solid state electronics, 71 (2012) S. 19 - 24
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
3
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
4
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
5
Lopes, J.M.J.
2011
2011
6
Nichau, A.
2011
2011
7
Nichau, A.
2011
2011
8
Durgun Özben, E.
2011
2011
IEEE Transactions on Electron Devices, 58 (2011) S. 617 - 622
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
9
Durgun Özben, E.
2011
2011
IEEE Electron Device Letters, 32 (2011) S. 15 - 17
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
10
Lupták, R.
2011
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A301
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
11
Durgun Özben, E.
2011
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A903
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
12
Durgun Özben, E.
2010
2010
13
Durgun Özben, E.
2010
2010
14
Durgun Özben, E.
2010
2010
15
Lopes, J. M. J.
2009
2009
16
Roeckerath, M.
2009
2009
17
Lopes, J. M. J.
2009
2009
18
Schubert, J.
2009
2009
19
Lopes, J. M. J.
2009
2009
20
Lopes, J. M. J.
2009
2009