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1
Minamisawa, R.A.
2012
2012
Journal of the Electrochemical Society, 159 (2012) S. H44 - H51
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
2
Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
3
Nichau, A.
2012
2012
Solid state electronics, 71 (2012) S. 19 - 24
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
4
Zhao, Q.T.
2012
2012
5
Yu, W.
2012
2012
6
Zhao, Q.T.
2012
2012
7
Zhao, Q.T.
2012
2012
8
Schmidt, M.
2012
2012
9
Richter, S.
2012
2012
10
Knoll, L.
2012
2012
11
Zhao, Q.T.
2012
2012
12
Zhang, B.
2012
2012
13
Yu, W.
2012
2012
14
Zhao, Q.T.
2012
2012
15
Habicht, S.
2012
2012
Thin solid films, 520 (2012) S. 3332 - 3336
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
16
Trinkaus, H.
2012
2012
Journal of applied physics, 111 (2012) S. 014904
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”Get full text Published under German "Allianz" Licensing conditions on 2012-01-05. Available in OpenAccess from 2012-01-05
17
Stefanov, S.
2012
2012
Applied physics letters, 100 (2012) S. 104101
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”Get full text Published under German "Allianz" Licensing conditions on 2012-03-06. Available in OpenAccess from 2012-03-06
18
Schäfer, A.
2012
2012
19
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
20
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012