JuLib | Articles & more - {"JARA-FIT; JARA-FIT"}

1

Modulation phenomena in Si nanowire field-effect transistors characterized using noise spectroscopy and gamma radiation technique

Pud, S.
2013

Journal of applied physics, 113 12, S. 124503 -1-10

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
OpenAccess

2

Contribution to a book
Contribution to a conference proceedings

Planar and Nanowire Schottky Barrier MOSFETs on SOI with NiSi and Epitaxial NiSi2 Contacts

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

3

Journal Article

Electrical characterization of O-gated uniaxial tensile strained Si nanowire-array metal-oxide-semiconductor field effect transistors with <100> and <110> channel orientations

Habicht, S.
2012

Thin solid films, 520 (2012) S. 3332 - 3336

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

4

Conference Presentation

High Mobility Materials and Structures for Low Power Device Application

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

5

Talk (non-conference)

Hole mobility enhancement of quantum-well p-MOSFETs on sSi/sSi0.5Ge0.5/sSOI heterostructure

Yu, W.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

6

Talk (non-conference)

Planar and Nanowire Schottky Barrier MOSFETs on SOI with NiSi and Epitaxial NiSi2 Contacts

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

7

Conference Presentation

Ultrathin epitaxial Ni-silicide contacs on Si and SiGe: Structural and electrical investigation

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

8

Contribution to a book
Contribution to a conference proceedings

Si/SiGe Hetero-Structure Tunneling Field Effect Transistors with In-Situ Doped SiGe Source

Schmidt, M.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

9

Contribution to a book
Contribution to a conference proceedings

Strained Silicon Nanowire Array MOSFETs with High-k/Metal Gate Stack

Richter, S.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

10

Contribution to a book
Contribution to a conference proceedings

Nanowire and Planar UTB SOI Schottky Barrier MOSFETs with Dopant Segregation

Knoll, L.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

11

Contribution to a book
Contribution to a conference proceedings

Ultrathin epitaxial Ni-silicide contacts on Si and SiGe: Structural and electrical investigation

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

12

Contribution to a book
Contribution to a conference proceedings

Epitaxial growth and properties of NiSiGe

Zhang, B.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

13

Contribution to a book
Contribution to a conference proceedings

Hole mobility enhancement of quantum-well p-MOSFETs on sSi/sSi0.5 Ge0.5/sSOI heterostructure

Yu, W.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

14

Journal Article

p-Type Ion Implantation in Tensile Si/Compressive Si0.5Ge0.5/Tensile Strained Si Heterostructures

Minamisawa, R.A.
2012

Journal of the Electrochemical Society, 159 (2012) S. H44 - H51

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

15

Conference Presentation

Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration

Nichau, A.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

16

Journal Article

LaLuO3 higher-k dielectric integration in SOI MOSFETs with a gate-first process

Nichau, A.
2012

Solid state electronics, 71 (2012) S. 19 - 24

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

17

Poster

Using ALD and AVD-techniques for scaled gate stacks

Schäfer, A.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

18

Poster

Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration

Nichau, A.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

19

Poster

Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration

Nichau, A.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

20

Journal Article

Impact of strain and Ge concentration on the performance pf planar SiGe band-to-band-tunneling transistors

Schmidt, M.
2012

Solid state electronics, 71 (2012) S. 42 - 47

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

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