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1

Contribution to a book
Contribution to a conference proceedings

Substrate engineering by hydrogen or helium implantation for epitaxial growth of lattice mismatched Si(1-x)Gex films on silicon

Holländer, B.
2001

“...Ionentechnik...”

2

Journal Article

Strain relaxation of pseudomorphic Si(1-X)GeX/Si(100) heterostructures after hydrogen or helium ion implantation for virtual substrate fabrication

Holländer, B.
2001

Nuclear instruments & methods in physics research / B, 175/177 (2001) S. 357 - 367

“...Ionentechnik...”

3

Talk (non-conference)

Strain relaxation of pseudomorphic Si(1-X)GeX layers on Si(100) after helium ion implantation

Mantl, S.
2001

“...Ionentechnik...”

4

Strain relaxation of He+ implanated pseudomorphic Si(1-X)GeX layers on Si(100)

Holländer, B.
2001

“...Ionentechnik...”

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