41
Photons and low energy particles in surface processing: symposium: Boston, MA, 03.12.91-06.12.91 /
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42
Etching of III-V semiconductors : an electrochemical approach /
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43
Plasma deposition, treatment, and etching of polymers /
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44
In situ patterning: selective area deposition and etching: symposium : Boston, MA, 29.11.89-01.12.89.
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45
Halbleiterätzverfahren: Kinetik, Verfahrensgrundlagen und Anwendungsgebiete von nasschemischen Ätzverfahren für Silizium, Galliumarsenid, Galliumphosphid und Indiumphosphid.
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Loewe, H.
1990
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46
Kalte Plasmen : Grundlagen, Erscheinungen, Anwendungen /
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47
Supraleitende Schalter aus gestapelten Niob-Mikrobrücken [E-Book] /
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48
Plasma-surface interactions and processing of materials : NATO Advanced Study Institute on Plasma Surface Interactions and Processing of Materials: proceedings : Alicante, 04.09.88-16.09.88 /
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49
Plasma etching : an introduction /
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50
International Conference on Phenomena in Ionized Gases. 19. Contributed papers 3 Wednesday 12th July 1989 : Beograd, 10th - 14th July 1989 /
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51
Plasma surface engineering vol 0001 : International conference on plasma surface engineering 0001: papers : Garmisch-Partenkirchen, 19.09.88-23.09.88.
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52
Microelectronics processing: chemical engineering aspects /
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Subject (ZB): “...plasma etching...”
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53
Etching of crystals : theory, experiment, and application /
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Subject (ZB): “...etching...”
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54
Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators.
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Subject (ZB): “...etching...”
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55
Solid state nuclear track detection : principles, methods and applications.
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Subject (ZB): “...etching...”
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56
Metallographische Anleitung zum Farbätzen nach dem Tauchverfahren. 3. Nichteisenmetalle, Hartmetalle und Eisenwerkstoffe, Nickelbasislegierungen und Kobaltbasislegierungen /
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Weck, E.
1986
Subject (ZB): “...etching...”
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57
Plasma synthesis and etching of electronic materials : Symp : Boston, MA, 27.11.1984-30.11.1984.
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58
Plasma etching in semiconductor fabrication.
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59
Advances in thin film technology : Sputtering and etching : Materials Research Corporation : sputtering schools. 34 and 35 : Roma, Santa-Barbara, CA, 06.84 ; 11.84.
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Weinig, S.
1984
Subject (ZB): “...ion etching...”
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60
The physics of VLSI : Proceedings of the international conf : Physics of semiconductors : international conference. 0017 : Palo-Alto, CA, San-Francisco, CA, 01.08.1984-03.08.1984 ; 06.08.1984-10.08.1984.
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