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Knoll, L.

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Knoll, L.

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Contribution to a book 5 Contribution to a conference proceedings 5 Conference Presentation 4 Journal Article 4 Poster 1 Talk (non-conference) 1

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Journal Article

LaLuO3 higher-k dielectric integration in SOI MOSFETs with a gate-first process

Nichau, A.
2012

Solid state electronics, 71 (2012) S. 19 - 24

“...Habicht, S....”

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Conference Presentation

Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs

Nichau, A.
2011

“...Habicht, S....”

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Conference Presentation

NiSi Nano-contacts to Strained and Unstrained Silicon Nanowires

Habicht, S.
2011

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Journal Article

Study of Arsenic ion implantation of patterned strained Si NWs

Minamisawa, R. A.
2011

Solid state electronics, 60 (2011) S. 31 - 36

“...Habicht, S....”

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Contribution to a book
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Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs

Nichau, A.
2011

“...Habicht, S....”

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Contribution to a book
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NiSi Nano-contacts to Strained and Unstrained Silicon Nanowires

Habicht, S.
2011

“...Habicht, S....”

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Contact resistivity and nickel silicidation of strained and unstrained silicon nanowires

Habicht, S.
2010

“...Habicht, S....”

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Conference Presentation

Formation and Characterization of Ultra-Thin Ni Silicides on Strained and Unstrained Silicon

Zhao, Q. T.
2010

“...Habicht, S....”

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Conference Presentation

Formation and characterization of Ultra-Thin NiSi, Ni1-xPtxSi and epitaxial NiSi2on Si(001) substrates

Knoll, L.
2010

“...Habicht, S....”

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Contribution to a book
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Formation and Characterization of Ultra-Thin Ni Silicides on Strained and Unstrained Silicon

Knoll, L.
2010

“...Habicht, S....”

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Contribution to a book
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Contact resistivity and nickel silicidation of strained and unstrained silicon nanowires

Habicht, S.
2010

“...Habicht, S....”

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Electrical characterization of strained and unstrained silicon nanowires with nickel silicide contacts

Habicht, S.
2010

Nanotechnology, 21 (2010) S. 105701

“...Habicht, S....”

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Journal Article

Ultrathin Ni Silicides with low contact resistance on Strained and Unstrained Silicon

Knoll, L.
2010

IEEE Electron Device Letters, 31 (2010) S. 350 - 352

“...Habicht, S....”

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From strained SOI layers to sSi NW: stress and electrical characterization

Minamisawa, R. A.
2010

“...Habicht, S....”

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Ultra thin Ni-silicides with low contact resistance on SOI and strained-SOI

Knoll, L.
2009

“...Habicht, S....”

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Publications database 15

Contribution to a book 5 Contribution to a conference proceedings 5 Conference Presentation 4 Journal Article 4 Poster 1 Talk (non-conference) 1

Habicht, S. 15 Knoll, L. Mantl, S. 14 Zhao, Q. T. 10 Urban, C. 5 Zhao, Q.T. 5 more ... Bourdelle, K.K. 4 Buca, Dan Mihai 4 Besmehn, A. 3 Castro, G.R. 3 Dürgün-Özben, Eylem 3 Feste, S. F. 3 Ghyselen, B. 3 Lenk, Steffi 3 Lopes, J.M.J. 3 Luptak, R. 3 Mussmann, V. 3 Nichau, A. 3 Rubio-Zuazo, J. 3 Schnee, M. 3 Schubert, Jürgen 3 Trellenkamp, Stefan 3 Feste, S.F. 2 Luysberg, Martina 2 Minamisawa, R. A. 2 Boudelle, K.K. 1 Carius, R. 1 Feste, S. 1 Fox, A. 1 Kernevez, N. 1 see all ... less ...

Grundlagen für zukünftige Informationstechnologien 14 Silicon-based nanostructures and nanodevices for long term nanoelectronics applications 2 Erneuerbare Energien 1

JARA-FIT; JARA-FIT 14 Halbleiter-Nanoelektronik; IBN-1 9 Halbleiter-Nanoelektronik; PGI-9 5 Bioelektronik; PGI-8 2 Mikrostrukturforschung; PGI-5 2 Zentralabteilung für Chemische Analysen; ZCH 2 more ... Photovoltaik; IEK-5 1 Prozesstechnologie; IBN-PT 1 see all ... less ...

2010 8 2011 5 2009 1 2012 1

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