Document Type within your search.
Document Type within your search.
1
Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
2
Nichau, A.
2012
2012
Solid state electronics, 71 (2012) S. 19 - 24
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
3
Schäfer, A.
2012
2012
4
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
5
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
6
Lopes, J.M.J.
2011
2011
7
Nichau, A.
2011
2011
8
Yu, W.
2011
2011
Solid state electronics, 62 (2011) 1, S. 185 - 188
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
9
Nichau, A.
2011
2011
10
Durgun Özben, E.
2011
2011
IEEE Transactions on Electron Devices, 58 (2011) S. 617 - 622
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
11
Durgun Özben, E.
2011
2011
IEEE Electron Device Letters, 32 (2011) S. 15 - 17
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
12
Durgun Özben, E.
2011
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A903
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
13
Durgun Özben, E.
2010
2010
14
Radtke, C.
2010
2010
Electrochemical and solid-state letters, 13 (2010) S. G37 - G39
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
15
Lopes, J. M. J.
2010
2010
16
Yu, W.
2010
2010
17
Zhao, Q. T.
2010
2010
18
Yu, W.
2010
2010
19
Yu, W.
2010
2010
20
Yu, W.
2010
2010