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1
Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
2
Nichau, A.
2012
2012
Solid state electronics, 71 (2012) S. 19 - 24
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
3
Schäfer, A.
2012
2012
4
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
5
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Nichau, A.
2012
2012
6
Lopes, J.M.J.
2011
2011
7
Durgun Özben, E.
2011
2011
IEEE Electron Device Letters, 32 (2011) S. 15 - 17
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
8
Minamisawa, R.A.
2011
2011
Microelectronic engineering, 88 (2011) S. 2955 - 2958
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
9
Nichau, A.
2011
2011
10
Nichau, A.
2011
2011
11
Durgun Özben, E.
2011
2011
IEEE Transactions on Electron Devices, 58 (2011) S. 617 - 622
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12
Durgun Özben, E.
2011
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A903
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13
Lupták, R.
2011
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A301
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14
Durgun Özben, E.
2010
2010
15
Yu, W.
2010
2010
16
Radtke, C.
2010
2010
Electrochemical and solid-state letters, 13 (2010) S. G37 - G39
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17
Lopes, J. M. J.
2010
2010
18
Roeckerath, M.
2010
2010
Applied physics letters, 96 (2010) S. 013513
“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”Get full text OpenAccess OpenAccess
19
Yu, W.
2010
2010
20
Yu, W.
2010
2010