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1999
Poster
Institut für Schicht- und Ionentechnik; ISI
Mantl, S.
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1999
Poster
Institut für Schicht- und Ionentechnik; ISI
Mantl, S.
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Select result number 1
1
Poster
New high-precision 5-Axis RBS/channeling goniometer for ion beam analysis of 150 mm wafers
Holländer, B.
1999
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2
Poster
Properties of ion implanted epitaxial CoSi2/Si(100) after rapid thermal oxidation
Zhao, Q. T.
1999
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3
Poster
Ultrafast silicon based internal photoemission detectors
Löken, M.
1999
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4
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Strukturelle, elektrische und optische Charakterisierung halbleitender Ru2Si3-Schichten
Lenssen, D.
1999
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5
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Structural electrical and optical characterization of semiconductor Ru2Si3
Lenssen, D.
1999
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6
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Nanometer patterning of ultra-thin cobalt disilicide by local application of stress
Zhao, Q. T.
1999
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6
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Poster
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Mantl, S.
Kappius, L.
3
Bay, H. L.
2
Carius, R.
2
Dieker, C.
2
Guggi, D.
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Kluth, P.
2
Lenssen, D.
2
Xu, J.
2
Zhao, Q. T.
2
Buchal, C.
1
Halling, H.
1
Heer, H.
1
Holländer, Bernhard
1
Löken, M.
1
Mesters, S.
1
Wagener, M.
1
Wang, Z. L.
1
Zastrow, U.
1
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Research Program
Ionentechnik
6
Contributing Institute
Institut für Schicht- und Ionentechnik; ISI
Scientific Report
1999
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