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Field assisted sintering of yttria ceramics for plasma etching applications /
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Principles of plasma discharges and materials processing /
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Low temperature plasma physics : fundamental aspects and applications /
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Plasma processes for semiconductor fabrications /
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Handbook of industrial diamonds and diamond films /
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Ein anisotroper Plasmaätzprozess in Silizium für die Mikromechanik.
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Modeling and simulation of thin film processing : Symposium on modeling and simulation of thin film processing: proceedings: papers : San-Francisco, CA, 17.04.95-20.04.95.
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Introduction to microlithography.
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Cold plasma in materials fabrication : from fundamentals to applications /
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Plasma sources for thin film deposition and etching.
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Photons and low energy particles in surface processing: symposium: Boston, MA, 03.12.91-06.12.91 /
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Plasma deposition, treatment, and etching of polymers /
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Kalte Plasmen : Grundlagen, Erscheinungen, Anwendungen /
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Plasma-surface interactions and processing of materials : NATO Advanced Study Institute on Plasma Surface Interactions and Processing of Materials: proceedings : Alicante, 04.09.88-16.09.88 /
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Plasma etching : an introduction /
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International Conference on Phenomena in Ionized Gases. 19. Contributed papers 3 Wednesday 12th July 1989 : Beograd, 10th - 14th July 1989 /
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Plasma surface engineering vol 0001 : International conference on plasma surface engineering 0001: papers : Garmisch-Partenkirchen, 19.09.88-23.09.88.
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Microelectronics processing: chemical engineering aspects /
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Plasma synthesis and etching of electronic materials : Symp : Boston, MA, 27.11.1984-30.11.1984.
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Plasma etching in semiconductor fabrication.
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