JuLib | Articles & more - {"JARA-FIT; JARA-FIT"}

1

Atomic layer deposition of HfO2 and Al2O3 layers on 300 mm Si wafers for gate stack technology

Lupták, R.
2011

Journal of vacuum science & technology / B, 29 (2011) S. 01A301

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

2

Electrical and structural properties of ternary rare-earth oxides on Si and higher mobility substrates and their integration as high-k gate dielectrics in MOSFET devices

Lopes, J.M.J.
2011

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

3

Journal Article

Formation of steep, low Schottky-barrier contacts by dopant segregation during nickel silicidation

Feste, S. F.
2010

Journal of applied physics, 107 (2010) S. 044510-6

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
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4

Poster

Investigation of Arsenic dopant segregation layers for scaled Schottky-Barrier MOSFETs

Feste, S. F.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

5

Poster

Flask Lamp Activation of n- and p-type dopants in strained and unstrained SOI and SGOI

Minamisawa, R. A.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

6

Journal Article

High temperature antimony ion implantation in strained silicon-on-insulator

Buca, D.
2009

Solid state electronics, 53 (2009) S. 828 - 832

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

7

Journal Article

Isotopic labeling study of oxygen diffusion in amorphous LaScO3 high-k films on Si(100) and its effects on the electrical characteristics

Lopes, J. M. J.
2009

Applied physics / A, 96 (2009) S. 447 - 451

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

8

Contribution to a book
Contribution to a conference proceedings

Schottky-barrier height tuning og Ni and Pt germanide/n-Ge contacts using dopant segregation

Müller, M.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

9

Journal Article

Amorphous ternary rare-earth gate oxides for future integration in MOSFETs

Lopes, J. M. J.
2009

Microelectronic engineering, 86 (2009)

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

10

Contribution to a book

Flash Lamp Activation of n- and p-type dopants in strained and unstrained SOI and HOI

Minamisawa, R. A.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

11

Conference Presentation

Rare-earth based alternative gate dielectrics for future integration in MOSFETs

Lopes, J. M. J.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

12

Contribution to a book
Contribution to a conference proceedings

Rare-earth based alternative gate dielectrics for future integration in MOSFETs

Lopes, J. M. J.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

13

Talk (non-conference)

Rare-earth Scandate High-k Films for Future Ge CMOS Technologies

Lopes, J. M. J.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

14

Talk (non-conference)

Ternary rare-earth based gate dielectrics for future integration in MOSFETs

Schubert, J.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

15

Talk (non-conference)

Amorphous ternary rare-earth gate oxides for future integration in MOSFETs

Roeckerath, M.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

16

Poster

Alternative ternary gate-dielectrics on germanium substrates

Schubert, J.
2009

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

17

Contribution to a book
Contribution to a conference proceedings

Schottky barrier height modulation by Arsenic Dopant segregation

Urban, C.
2008

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

18

Poster

Schottky Barrier Height Modulation by Arsenic Dopant Segregation

Urban, C.
2008

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

19

Poster

Schottky Barrier Height Modulation by Dopant Segregation

Urban, C.
2008

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

20

Journal Article

Boron activation and diffusion in silicon and strained silicon-on-insulator by rapid thermal and flash lamp annealings

Lanzerath, F.
2008

Journal of applied physics, 104 (2008) S. 044908

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”
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